RESIST APPLYING APPARATUS

申请公布号：

JPS61219135(A)

申请号：

JP19850059846

申请日期：

1985.03.25

申请公布日期：

1986.09.29

申请人：

TOSHIBA CORP

发明人：

MIKANOHARA MASAKO

分类号：

B05C11/08;H01L21/027;H01L21/30

主分类号：

B05C11/08

摘要：

PURPOSE:To prevent any unrequired resist splittings from being produced after the resist applying process, by providing means for removing the resist adhered on the peripheral face of a plate. CONSTITUTION:The present resist applying apparatus is provided with an arm 7 moving along the peripheral face of a plate 3 and with a wiper 8 fixed at the tip end of the arm. The plate 3 generally has a square shape and the arm 7 is adapted to move along the peripheral face of the square plate 3. This means that the movement of the arm 7 is confined to linear reciprocating movements along a groove 9. Since the groove 9 is provided in parallel with one side of the square plate 3, one advancing movement of the arm 7 removes the resist from one side of the square. When the resist removal from the one side is finished, the square plate 3 is rotated by 90 deg. by means of a rotating device and the arm 7 moves backward. Thus, all the resist on the four sides of the square plate 3 can be completely removed by two reciprocating movements of the arm 7.