PHOTORESIST COATING COMPOSITION

申请公布号：

JPH03200966(A)

申请号：

JP19900273723

申请日期：

1990.10.12

申请公布日期：

1991.09.02

申请人：

MITSUBISHI KASEI CORP

发明人：

NISHI MINEO;SAKAGUCHI MASAHIRO

分类号：

G03F7/022;H01L21/027

主分类号：

G03F7/022

摘要：

PURPOSE:To inhibit the formation of insoluble foreign matter and to obtain a photoresist coating compsn. having satisfactory shelf stability by incorporating a specified compd. as a solvent. CONSTITUTION:When a photoresist coating compsn. consisting of an alkalisoluble resin, a sensitizer contg. an o-quinonediazido group and a solvent is prepd., a compd. represented by formula I (where R is 1-4C alkyl) is incorporated as the solvent. A photoresist coating compsn. having low toxicity, satisfactory suitability to coating and satisfactory shelf stability is obtd.