NEW POLYMER
- 申请公布号:
- JPH11269230(A)
- 申请号:
- JP19980360046
- 申请日期:
- 1998.12.03
- 申请公布日期:
- 1999.10.05
- 申请人:
- WAKO PURE CHEM IND LTD;MATSUSHITA ELECTRIC IND CO LTD
- 发明人:
- URANO FUMIYOSHI;NEGISHI TAKAAKI;KATSUYAMA AKIKO;ENDO MASATAKA
- 分类号:
- G03F7/039;C08F212/06;C08F212/14;H01L21/027;(IPC1-7):C08F212/06
- 主分类号:
- G03F7/039
- 摘要:
- PROBLEM TO BE SOLVED: To obtain a resist material showing heat resistance and high resolution by using a polymer which comprises a p-ethoxystyrene unit, a p-hydroxystyrene unit, a p-methylstyrene unit and the like. SOLUTION: A resist material is a polymer represented by formula I which contains monomer units represented by formulas II and III, the sum of II and III being 10-90 mol.% of the total polymer, the monomer unit of III being 1-25 mol.% of the total polymer, and has weight average molecular weight of 3,000-50,000, 100 pts.wt of said polymer and 1-30 pts.wt. of an acid generator such as a bis(1-methylethylsulfonyl)diazomethane are dissolved in 100-2,000 pts.wt. of a solvent to give a positive type resist material (R<1> is H or methyl; R<2> and R<3> are H, a 1-6C alkyl, phenyl or the like; R<4> is a 1-10C alkyl, acetyl or the like; R<5> is H, a halogen, 1-6C alkyl or the like; 0.10 <=(k+m)/(k+r+ m)<=0.90; and 0.10<=m/(k+r+m))<=0.25).
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