Etch improved resist systems containing acrylate (or methacrylate) silane monomers
- 申请公布号：
- US6586156(B2)
- 申请号：
- US20010907392
- 申请日期：
- 2001.07.17
- 申请公布日期：
- 2003.07.01
- 申请人：
- INTERNATIONAL BUSINESS MACHINES CORPORATION
- 发明人：
- ANGELOPOULOS MARIE;HUANG WU-SONG;JUNYAN DAI;KWONG RANEE W.;LANG ROBERT N.;MAHOROWALA ARPAN P.;MEDEIROS DAVID R.;MOREAU WAYNE M.;PETRILLO KAREN E.
- 分类号：
- G03F7/038;G03F7/039;(IPC1-7):G03F7/004;C08F30/08
- 主分类号：
- G03F7/038
- 摘要：
- A chemically amplified (CA) photoresist system wherein a terpolymer containing ketal/phenolic/silicon based sidechains is provided. Among other things, the terpolymers provide for improved bake technologies. In another aspect a process for lithographic treatment of a substrate by means of ketal/phenolic/silicon based compositions and corresponding processes for the production of an object, particularly an electronic component are provided.
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