SUBSTRATE FOR MANUFACTURING CARBON NANOTUBE AND METHOD OF MANUFACTURING CARBON NANOTUBE USING THE SAME

申请公布号:
JP2004051432(A)
申请号:
JP20020211479
申请日期:
2002.07.19
申请公布日期:
2004.02.19
申请人:
FUJITSU LTD
发明人:
KAWABATA AKIO
分类号:
B82B3/00;C01B31/02;(IPC1-7):C01B31/02
主分类号:
B82B3/00
摘要:
PROBLEM TO BE SOLVED: To provide a substrate for manufacturing carbon nanotube which is capable of protecting a catalyst metal from damage caused by plasma, etc., suppressing the aggregation of the catalyst metal and growing the carbon nanotube using the fine catalyst metal exposed by etching with the plasma as a nucleus and a method manufacturing the carbon nanotube using the substrate. SOLUTION: The substrate for manufacturing the carbon nanotube has a base material for supporting the catalyst metal, the catalyst metal on the base material and a catalyst metal protecting layer provided on the catalyst metal and capable of being dry-etched. COPYRIGHT: (C)2004,JPO
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