Method for manufacturing large area stamp for nanoimprint lithography
- 申请公布号：
- EP1594002(A3)
- 申请号：
- EP20050000648
- 申请日期：
- 2005.01.14
- 申请公布日期：
- 2006.02.01
- 申请人：
- LG ELECTRONICS INC.
- 发明人：
- LEE, KI DONG
- 分类号：
- B82B3/00;G03F7/00;B29C59/02;H01L21/00;H01L21/027
- 主分类号：
- B82B3/00
- 摘要：
- <p>Provided is a method for manufacturing a large area stamp for nanoimprint lithography using a fabricated small area stamp. The method includes: fabricating a first small area stamp having a pattern less than a few hundred nanometers; and fabricating a second large area stamp having a pattern less than a few hundred nanometers by a step-and-repeat method using the fabricated first small area stamp.
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