AROMATIC COMPOUND

申请公布号：

JP2006176466(A)

申请号：

JP20040373145

申请日期：

2004.12.24

申请公布日期：

2006.07.06

申请人：

SUMITOMO CHEMICAL CO LTD

发明人：

YOKOTA AKIRA;SATO HISAYA

分类号：

C07C15/16;H01L21/312

主分类号：

C07C15/16

摘要：

PROBLEM TO BE SOLVED: To provide a compound usable for the production of an insulating film having finer voids in the case of forming a porous film having excellent properties as an insulating film for electronic parts. SOLUTION: The compound is expressed by formula (1): R<SP>1</SP>-R-R<SP>2</SP>. In the formula, R<SP>1</SP>- and R<SP>2</SP>- are each expressed by formula (2); R<SP>1A</SP>, R<SP>1B</SP>, R<SP>1C</SP>, R<SP>2A</SP>, R<SP>2B</SP>and R<SP>2C</SP>are each independently a 1-20C univalent hydrocarbon group or a hydrogen atom; at least one of R<SP>1A</SP>, R<SP>1B</SP>and R<SP>1C</SP>is a 1-20C hydrocarbon group having an aromatic ring; at least one of R<SP>2A</SP>, R<SP>2B</SP>and R<SP>2C</SP>is a 1-20C hydrocarbon group having an aromatic group; and R is a 1-10C bivalent saturated hydrocarbon group. COPYRIGHT: (C)2006,JPO&NCIPI