ILLUMINATION OPTICAL DEVICE, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD

申请公布号：: JP2010287747(A)
申请号：: JP20090140623
申请日期：: 2009.06.11
申请公布日期：: 2010.12.24
申请人：: NIKON CORP
发明人：: YOSHIMOTO RISA;YAMAMOTO MASAYA;MIYAKE TOSHIHIRO
分类号：: H01L21/027;G02B5/00;G03F7/20
主分类号：: H01L21/027
摘要：: <P>PROBLEM TO BE SOLVED: To adjust light intensity of illumination light passing through a predetermined region in an illumination optical system with simple constitution. <P>SOLUTION: The illumination optical device, which illuminates the pattern surface of a reticle R with the illumination light IL, includes: an aperture stop 10A having an aperture through which the illumination light IL passes; diaphragms 12A to 12C for adjustment, which are arranged overlapping the aperture and have light shield lines defining the aperture shape of the aperture stop 10A; and an optical member from a first relay lens 13 to a capacitor optical system 17, which illuminates the pattern surface with the illumination light IL having passed through the aperture shape. <P>COPYRIGHT: (C)2011,JPO&INPIT