INTERFERENCE MICROSCOPE AND MEASURING APPARATUS

申请公布号：: WO2011016146(A1)
申请号：: WO2009JP66318
申请日期：: 2009.09.11
申请公布日期：: 2011.02.10
申请人：: KABUSHIKI KAISHA TOPCON;OOTOMO, FUMIO;NUNOKAWA, KAZUO;MOMIUCHI, MASAYUKI;ISOZAKI, HISASHI;MIYAKAWA, KAZUHIRO
发明人：: OOTOMO, FUMIO;NUNOKAWA, KAZUO;MOMIUCHI, MASAYUKI;ISOZAKI, HISASHI;MIYAKAWA, KAZUHIRO
分类号：: G01B9/02;G01B11/24;G01N21/956
主分类号：: G01B9/02
摘要：: <p>Provided are an interference microscope wherein samples, such as a wafer, are irradiated with a laser beam, and the inside of the sample surface is observed and inspected by using an interferometer, and a measuring apparatus. A reference light path for guiding light to between a beam splitter and a reference mirror is arranged, and a measuring light path for guiding light to between the beam splitter and the sample is also arranged, thus, an optical light path difference is provided between the reference light path and the measuring light path. Furthermore, interference fringes are formed in a detecting means by slightly tilting the reference mirror. With such simple constitution, the surface shapes of the samples (subjects to be measured), such as the wafer, are measured only by slightly tilting the reference mirror, and accurate coordinate positions of dusts, pole piece and the like can be specified.</p>