Techniques for processing a substrate

申请公布号：

EP2642513(A3)

申请号：

EP20130172471

申请日期：

2010.04.08

申请公布日期：

2014.03.19

申请人：

VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES INC.

发明人：

DANIELS, KEVIN M.;LOW, RUSSELL J.;RIORDON, BENJAMIN B.

分类号：

H01L21/266;H01J37/317;H01L31/18

主分类号：

H01L21/266

摘要：

<p>Herein, an improved technique for processing a substrate is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for processing a substrate. The method may comprise directing an ion beam comprising a plurality of ions along an ion beam path, from an ion source to the substrate; disposing at least a portion of a mask in the ion beam path, between the ion source and the substrate; and translating one of the substrate and the mask relative to other one of the substrate and the mask. </p>