光散乱素子の製造方法

申请公布号：

JP5862945(B2)

申请号：

JP20110262247

申请日期：

2011.11.30

申请公布日期：

2016.02.16

申请人：

国立研究開発法人産業技術総合研究所

发明人：

内田 江美;福田 隆史;江本 顕雄

分类号：

G02B5/02

主分类号：

G02B5/02

摘要：

<P>PROBLEM TO BE SOLVED: To improve control accuracy of a light scattering state obtained by exposure and achieve multiple recording based on exposure including additional recording. <P>SOLUTION: A recording film 2 is prepared which includes photoreactive molecules 5 mixed in a transparent base material 4 in a cured state. Exposure is performed by using light 8 having the absorption wavelength region of the photoreactive molecules 5 to the recording film 2 at an arbitrary incident angle and in an arbitrary incident area, and photoreaction according to the exposure converts the photoreactive molecule 5 into a light scattering body 3 having optical anisotropy in a light passing area 7 according to the exposure, thereby converting, into scattering light, only the light of illumination light, going from an incidence surface 6a through the light passing area 7 toward an emission surface 6b. In addition, multiple recording based on exposure including addition of scattering properties is performed by taking advantage of the fact that the photoreactive molecules 5 can photoreact by exposure at any time. <P>COPYRIGHT: (C)2013,JPO&INPIT