MANUFACTURE OF CONTACT TYPE IMAGE DEVICE

申请公布号：

JPS62249480(A)

申请号：

JP19860094299

申请日期：

1986.04.22

申请公布日期：

1987.10.30

申请人：

SHARP CORP

发明人：

KITA RYUSUKE;TSUCHIMOTO SHUHEI;HIJIKIGAWA MASAYA

分类号：

H01L27/146;H04N5/335

主分类号：

H01L27/146

摘要：

PURPOSE:To improve reproducibility of an inversely tapered cross section of resist and stabilize lifting-off and improve mass-productivity by a method wherein the resist pattern is formed by double-coating and the 1st layer is extensively exposed and the difference between the etching rate of the 1st layer and the etching rate of the 2nd layer is created. CONSTITUTION:A photoconductive film 32 is formed by applying photoconductor paste to a glass substrate 31 and subjected to a heat treatment and fine crystal particles are sintered to grow. Then 1st resist layer 33 is applied to the substrate 31 and to the photoconductive film 32 and, after the resist is dried in N2 atmosphere, the 1st resist layer 33 is extensively exposed to UV (ultraviolet) rays. Further, after 2nd resist layer 34 is applied to the 1st resist layer 33, a predetermined pattern is exposed and developed to form a resist pattern 35 which has an overhanging cross section by utilizing the difference between the etching rate of the 1st resist layer 33 and the etching rate of the 2nd resist layer 34. Then Ti is applied by DC sputtering and the resist and Ti on the resist are removed by ultrasonic wave in acetone to form a picture element part and a lower wiring 37 of a matrix.